June 26, 2019
Please check the image below with the 5 micrometer scale bar on the bottom. Perhaps this is the first time the Yale logo was made in a size smaller than human hair.
We tested direct patterning using the focused ion beam on our recently installed FEI Dual Beam system. The silicon material was etched away as the focused ion beam scanned across the surface. The machine is capable of making feature sizes in tens of nanometers with finely tuned ion beam.
Please click HERE for the system details.
