September 16, 2019
Dr. Joe Nabity from JC Nabity Lighography Systems came on September 14th to MCC to give us onsite training on Nanometer Pattern Generation System (NPGS). Josh Pondick from Judy Cha lab and Lei Wang as the primary NPGS system users attended this extensive three day training.
The NPGS was incorporated into our FIB-SEM dual beam system to provide the capability of electron beam lithography at the spatial resolution as small as 20 nm.