Equipment

X-ray Photoelectron Spectroscopy (XPS)

PHI VersaProbe II Scanning XPS Microprobe

The core technology of the VersaProbe II is PHI’s patented, monochromatic, micro-focused, scanning x-ray source which provides excellent large area and superior micro-area spectroscopy performance.

Features:

  • Multi-point mode large area analysis: Multiple spots can be chosen on the sample holder photograph for spectrum being collected at any interested points on a large sample or on multiple samples positioned on the 60 mm diameter sample platen. 

  • Single-point mode micro area analysis: spectrum can be collected at any specified single point on x-ray induced secondary electron image  (SXI) at a high resolution (<10 µm).
  • Elemental and chemical state imaging: Elemental and chemical state spectra are extracted at each pixel of SXI image and processed using PHI MultiPak software
  • Thin film profile analysis: the depth profile can be measured using Ar+ for inorganic films or C60 cluster gun for organic films with minimized chemical state damage.
  • UPS analysis: the valence band structure, molecular adsorption and word function measurement can be performed using equipped UV light source.

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Scanning Electron Microscopy (SEM)

Hitachi SU8230 UHR Cold Field Emission (CFE) SEM

Hitachi’s next generation Cold Field Emission SEM offers unmatched low‑voltage imaging and comprehensive analytical microanalysis with the uncompromised performance of CFE.

Features:

  • High signal to noise (S/N) and uncompromising resolution with high beam current and stability
  • Lower, upper and top detectors for SE/BSE signals
  • Photodiode backscattered electron (PD-BSE) detector
  • Enhanced deceleration and selective energy filter providing fine contrast differentiation at low accelerating voltages
  • High Spatial Resolution EDS analysis with BRUKER XFlash 5060FQ Annular EDS detector
  • STEM imaging

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X-ray Diffraction (XRD)

Rigaku SmartLab X-ray Diffractometer

The SmartLab X-ray Diffraction System includes a highly stable and reliable sealed tube x-ray generator that is fully integrated within the automated diffraction system and is compatible with the full range of SmartLab goniometer configurations.

Features:

  • Full automated alignment under computer control
  • A high-efficiency scintillation detector with high-count rate
  • Cross Beam Optics (CBO) permits easy switching between focusing (BB) and parallel beam (PB) geometries without reconfiguration
  • In-plane diffraction arm for in-plane measurements without reconfiguration
  • High temperature (~1500 C) measurements in air, vacuum and Helium
  • Air-Tight Sample Container for contamination free measurement

X-ray Fluorescence (XRF)

Rigaku ZSX Primus II XRF Spectrometer

The ZSX Primus II with its tube-above optics is a fully automated, sequential WDXRF spectrometer incorporating a smaller footprint and the most advanced design in the WDXRF industry. The tube-above optics of the ZSX Primus II, coupled with the ultra-thin end-window Rh target X-ray tube, guarantees reliability, flexibility and ease of use. Micro Analysis, down to 500 microns, and Mapping is now a field upgradeable option.

Features:

  • Wavelength Dispersive X-ray Fluorescence (WDXRF) systems with high resolution (typically 5 – 20 eV) and minimal spectral overlaps
  • Analysis of elements from Be to U
  • Tube above optics minimizes contamination issues
  • Micro analysis to analyze samples as small as 500 µm
  • Mapping feature for elemental topography/distribution
  • Helium seal means the optics are always under vacuum

Physical Property Measurement System (PPMS)

Quantum Design PPMS® DynaCool™

The instrument uses a single two-stage Pulse Tube cooler to cool  the superconducting magnet and the samples under study, providing a low vibration environment for electronic measurements. It employs a unique He-4 -based gas flow control system providing rapid temperature cycling and accurate temperature control. It also comes standard with an integrated Cryopump used to pump out the sample space to a vacuum of < 10-4 Torr. 
Features:
  • No need for liquid cryogens
  • Temperature range of 0.3 K – 400 K
  • 14 Tesla magnetic field
  • The Electrical Transport Option (ETO), which performs measurements of AC Resistance (frequency range 0.1 to 200 Hz), Hall Effect, I-V sweeps, critical currents. Measurement sensitivity is a few nV and resistance from a few μΩ to GΩ can be measured.
  • The Horizontal Sample Rotator enables to rotate the sample 0-180 degrees with respect to the direction of the field with an angular step size of 0.053 degrees.
  • The Multi-function Probe simplifies custom experiments the involve optics, microwaves or extra electrical leads. The eight-faceted probe head provides ample room for electrical or coaxial lead feedthroughs.
 

Raman Spectroscopy

Horiba LabRAM HR Evolution 

The LabRAM HR Evolution systems are ideally suited to both micro and macro measurements, and offer advanced confocal imaging capabilities in 2D and 3D. The true confocal microscope enables the most detailed images and analysis to be obtained with speed and confidence.

Features:

  • High spatial and spectral resolutions
  • UV to NIR
  • Ease of use and ergonomy
  • Ultra-Fast confocal imaging
  • Raman-AFM and TERS compatible
  • Ultra-Low Frequency
  • Automated particle location and chemical ID
  • Finding the best conditions for sample analysis
  • CaptuR laser trapping

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BET Surface Area and Porosity Analysis

Micromeritics ASAP 2460 Surface Area and Porosity Analyzer

The instrument incorporates a unique expandable system designed for high-performance and high sample throughput. It also includes intuitive MicroActive software that combines user-defined reports with the ability to interactively evaluate isotherm
 

Features:

  • Fully automated modular system optimized for walk-up sample screening
  • High throughput with two, four, or six independent analysis stations
  • BET surface area measurements in as little as 30 minutes
  • Dosing options of maximum volume increment or dosing over specified pressure ranges
  • Analysis temperature can be entered, calculated, or measured
  • Equilibration option allows user to specify equilibration times for different parts of the isotherm
  • Low surface area and micropore options
  • Innovative MicroActive software with advanced NLDFT modeling
  • State-of-the-art engineering ensures excellent accuracy, repeatability, and reproducibility from all ports, from the master control unit through one or two auxiliary analysis units.

Microsensor Multimeter

Unisense Microsensor Multimeter

This unit is a four-channel laboratory amplifier that enables you to measure multiple parameters at once. Two channels for amperometric sensors (O2, NO, H2, H2S, N2O, NOx-), one for potentiometric sensors (pH and Redox) and one channel for a temperature sensor give you complete flexibility for your experiments. It is easy to operate with automatic sensor recognition for most Unisense microsensors, OLED display, and direct communication to PC via USB connection.

Features:

  • Ease of use and simple data acquisition
  • Automatic sensor detection
  • Operated via OLED display and keypad
  • USB connectivity to Windows PC
  • Battery, external voltage, or mains power operation
  • Free SensorTrace Logger software included

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Thin Film Deposition Systems

FijiTM 200 Gen 2

Plasma Atomic Layer Deposition System

Features:
 
  • Continuous Mode™ (Traditional Thermal ALD)
  • Exposure Mode™ (High Aspect Ratio ALD)
  • Plasma Mode™ (Plasma-Enhanced ALD)
  • Substrate Size: up to 200 mm
  • Substrate Temperature: 500°C 200 mm substrate heater standard; 800°C 100 mm substrate heater optional
  • Deposition Uniformity: 1σ Uniformities; Thermal Al2O3 – 1.5% Plasma Al2O3 – 1.5%
  • Precursors: 4 precursor lines standard; 6 precursor lines optional; Accommodates gas, liquid, or solid precursors; Individually heatable to 200°C
  • Gases: 100 sccm Ar precursor carrier gas MFC; 200 sccm Ar plasma gas MFC; 100sccm N2 plasma gas MFC; 100 sccm O2 plasma gas MFC; 100 sccm H2 plasma gas MFC

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MB-EcoVap Thin Film Coater (MBRAUN)

Features:
 
  • For substrates up to 70 x 70 mm or 100 mm wafers
  • Automatic chamber lifting mechanism
  • Shielded view port for visual process monitoring
  • Recipe programmable PLC control
  • Removable protective shielding
  • Compatible with most standard deposition sources
  • Ergonomic to operate, easy to clean
  • UL listed and CE compliant

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